http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009098448-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_95585944cd76ddfb6dc33ed2a0b84403 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2007-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c29c5cce227a5fc64fc9847b7d67276 |
| publicationDate | 2009-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2009098448-A |
| titleOfInvention | Photoresist composition for extreme ultraviolet light and / or electron beam and microfabrication method using the same |
| abstract | The present invention provides a photoresist composition for extreme ultraviolet light and / or an electron beam having high sensitivity, high resolution and high fine workability, and a fine working method using the same. In a composition comprising a cyclic compound represented by the following general formula (1) and at least a photoacid generator, an acid diffusion inhibitor and a solvent, wherein the photoacid generator and the acid diffusion inhibitor each excludes the solvent. A photoresist composition for extreme ultraviolet light and / or an electron beam contained in an amount of 0 to 40% by weight. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110531581-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9513545-B2 |
| priorityDate | 2007-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 234.