http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009098213-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2007-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f1784d8d5536c8f0a015741a46eecbd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da70f0ee751771143f8486e137fe5bfa |
| publicationDate | 2009-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2009098213-A |
| titleOfInvention | Resist composition and resist pattern forming method |
| abstract | Provided are a resist composition and a resist pattern forming method capable of forming a resist pattern having a good shape. A substrate component (A) whose solubility in an alkali developer is changed by the action of an acid, an acid generator component (B) that generates an acid upon exposure, and a general formula (d1) [wherein R 1 to R 3 are each independently a hydrocarbon group which may have a substituent, and at least one of R 1 to R 3 is a polar group-containing hydrocarbon group, and R 1 to R 3 At least one of 3 is a hydrophobic group. However, any two of R 1 to R 3 may be bonded to each other to form a ring together with the nitrogen atom in the formula. ] The resist composition containing the amine (D1) having a molecular weight of 200 or more and an amine (D2) other than the amine (D1). [Chemical 1] [Selection figure] None |
| priorityDate | 2007-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 330.