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publicationDate 2009-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009094442-A
titleOfInvention Manufacturing method and structure of conductive film, and probe card provided with the conductive film
abstract A method of manufacturing a conductive film and a structure thereof, and a probe card including the conductive film. The conductive film covers a metal micro-wire array unit composed of a plurality of metal micro-wires in a single-layer unidirectional arrangement with an insulating thin film by LIGA technology and polymer thick film technology, and the insulating thin film has a high dielectric constant. And a metal thin film made of Ni-Co alloy having high conductivity and high strength. By applying surface treatment and mechanical healing technology in a vacuum environment, the metal micro-ray array unit is adhered and deposited to a predetermined thickness to form a conductive film, and this conductive film is necessary with an energy beam such as laser, ion beam or plasma. Cut to size. The conductive film is bonded to a wire expansion plate, thereby providing a probe card that can be applied to a wafer having an arbitrary bonding pad arrangement, has a low manufacturing cost, is easily repaired, and can perform a large area probe test. [Selection] Figure 14
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