| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_41fc0e70b92656ce7c14900c50adbdd6 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2007-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d9d8c9b952ac69f6ab4f77026d3227c5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b72507e3f6f45914f6202f3eb21eb89b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c0bf1ec9486391f981f92a429bf9794f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9adc57ba0410b4818386cf8ef472aa4 |
| publicationDate |
2009-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2009069409-A |
| titleOfInvention |
Composition for forming silicon-containing fine pattern and method for forming fine pattern using the same |
| abstract |
A composition for forming a fine pattern having high dry etching resistance and a method for forming the fine pattern are provided. A fine pattern forming composition comprising a resin comprising a repeating unit having a silazane bond and a solvent, and a fine pattern forming method using the same. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012137778-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8877634-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5290204-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010250118-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014178711-A |
| priorityDate |
2007-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |