http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009067648-A

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filingDate 2007-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2009-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009067648-A
titleOfInvention Method for forming titanium oxide film and titanium oxide film
abstract Provided is a method for forming a titanium oxide film containing rutile titanium oxide with few crystal defects on the surface of a substrate and having visible light responsiveness and high photocatalytic activity. Sputtering a target containing titanium in a plasma containing oxygen in a state where the substrate temperature and sputtering pressure are controlled on the surface of the substrate on which the lower layer film made of crystallized rutile-type titanium oxide is formed. A titanium oxide film having a multilayer structure in which an upper layer film containing rutile type titanium oxide with few crystal defects is formed on the surface of the lower layer film can be obtained. The titanium oxide film exhibits a photocatalytic activity equal to or higher than that of the anatase-type titanium oxide film, and has visible light responsiveness. [Selection] Figure 3
priorityDate 2007-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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