http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009057590-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73ebc284a55d5daf0e209d6186c9e65c |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00 |
| filingDate | 2007-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2fa2608c1f5757c8e04936d45a8c6a1e |
| publicationDate | 2009-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2009057590-A |
| titleOfInvention | Plasma processing apparatus, sputtering apparatus, and liquid crystal device manufacturing apparatus |
| abstract | Disclosed are a plasma processing apparatus, a sputtering apparatus, and a liquid crystal device manufacturing apparatus that prevent occurrence of abnormal discharge during plasma processing. The plasma processing apparatus 3 generates plasma by applying high-frequency power between electrodes 9a and 9b arranged opposite to each other in a chamber 3a. An adhesion preventing plate 30 for preventing the processing product from adhering to the inner wall surface of the chamber 3 a is provided, and at least a positive voltage is applied to the adhesion preventing plate 30. [Selection] Figure 1 |
| priorityDate | 2007-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 18.