http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009053692-A

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filingDate 2008-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56b2b9cdf02d2b573d6fe9a7e94170cf
publicationDate 2009-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009053692-A
titleOfInvention Blank mask and photomask manufacturing method using the same
abstract A blank mask for forming a fine etching target film pattern having a vertical side profile on a photomask and a photomask manufacturing method using the same are provided. A light blocking film, a carbon film, and a resist film are disposed on a transparent substrate such as a quartz substrate. The light blocking film 110 is made of a material capable of blocking transmitted light, for example, a chromium (Cr) film. Here, an oxide film 130 may be further disposed between the carbon film 120 and the resist film 140. The carbon film 120 is made of, for example, an amorphous carbon film. The manufacturing method includes exposing a resist film to form a resist pattern, then etching the oxide film using the resist film pattern as a mask, then etching the carbon film using the oxide film pattern as a mask, and then carbon film The light blocking film is etched using the pattern as a mask to form a light blocking film pattern. [Selection] Figure 1
priorityDate 2007-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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