http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009050848-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d190881d8107c22941489e4161263769
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07B35-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B09B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07B37-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C25-10
filingDate 2008-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d81a2330e4b4b86fc9ff4a9e920c084
publicationDate 2009-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009050848-A
titleOfInvention Detoxification facility for organic halogen contaminants and detoxification method for organic halogen contaminants
abstract An object of the present invention is to provide an organic halogen contaminant detoxification treatment facility capable of reducing maintenance frequency and an organic halogen contaminant detoxification treatment method capable of suppressing a decrease in treatment efficiency. A working space exposed to a gas containing an organic halogen compound is provided, and a light source that illuminates the working space is provided, and contaminants contaminated with the organic halogen compound are rendered harmless in the working space. An organic halogen contaminant detoxification treatment facility to be treated, wherein an ultraviolet removal mechanism is further provided so that 90% or more of light having a wavelength of 380 nm or less can be removed from the light irradiated from the light source to illuminate the work space Provided is an organic halogen contaminant detoxification treatment facility characterized by being provided. [Selection] Figure 1
priorityDate 2007-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 23.