http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009043511-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J31-12 |
| filingDate | 2007-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de976579a23d849e29860602eee00f42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee08f4cecac7ebeb8b2538a5d62ff0fc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce3484cd0695550cc289d5fe30f91fc3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c0a3f28f8ba1b97b7b13bc2a3644730 |
| publicationDate | 2009-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2009043511-A |
| titleOfInvention | Film pattern manufacturing method, electronic device using the same, electron-emitting device, electron source, and image display device manufacturing method |
| abstract | In manufacturing a film pattern having a base film, the obtained film pattern is uniformly obtained on the entire surface of the substrate without causing a pattern misalignment with the base film. A resin pattern capable of absorbing a solution containing a film-forming component is formed on a base film, the solution containing the film-forming component is absorbed into the resin pattern, and the resin pattern is cured by drying at a high temperature. The base film is etched using the resin pattern as a protective film, and then the resin pattern is baked to obtain a film pattern. [Selection] Figure 1 |
| priorityDate | 2007-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 64.