abstract |
(A) A silicon-containing compound obtained by hydrolytic condensation of a hydrolyzable silicon compound using an acid as a catalyst, (B) a compound represented by formula (1) or (2), L a H b X (1) (L is Li, Na, K, Rb or Ce, X is a hydroxyl group or an organic acid group, a is 1 or more, b is 0 or 1 or more) M a H b A (2) (M is sulfonium, iodonium or ammonium, and A is the above X or non-nucleophilic counterion) (C) an organic acid, (D) an alcohol having a cyclic ether as a substituent, (E) A composition for forming a thermosetting silicon-containing film containing an organic solvent. [Effect] By using the silicon-containing intermediate film formed with the thermosetting silicon-containing film-forming composition of the present invention, a good pattern can be formed. In addition, the photoresist pattern can be transferred, and the substrate can be processed with high accuracy. [Selection figure] None |