http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009026935-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c1e0fc105cdaa6fc6208bcc48eadab50 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05G2-00 |
| filingDate | 2007-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6da478b0f8f8ffb9a1825adae282b94a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e16ea10a7a2109476fc59abaab4aacea http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_150ba13b8f6902863a8ace29a4ea3700 |
| publicationDate | 2009-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2009026935-A |
| titleOfInvention | Pre-treatment and cleaning method for condensing reflector and extreme ultraviolet light source device provided with condensing reflector |
| abstract | To provide a pre-processing and cleaning method for a condensing reflector and an extreme ultraviolet light source device capable of completely removing contaminants deposited on the light reflecting surface of the condensing reflector. A discharge gas is supplied to a plasma generation unit, and a high voltage pulse voltage is applied from a high voltage pulse generation unit to a first main discharge electrode and a second main discharge electrode. Thereby, high temperature plasma is generated and extreme ultraviolet light having a wavelength of 13.5 nm is emitted. This extreme ultraviolet light is collected by the condensing reflecting mirror 4 and emitted from the EUV light extraction unit 5. The debris generated by the generation of the high temperature plasma forms a contaminant layer on the light reflecting surface of the condensing reflector 4, and in order to completely remove this, in the present invention, the contaminant layer is collected before the contaminant layer is formed. A cleaning gas constituent material is adhered to the surface of the light reflecting mirror. Thereby, the contaminant can be removed almost completely by circulating the cleaning gas from the cleaning gas supply nozzle 25. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10168627-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012523106-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009088439-A |
| priorityDate | 2007-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.