http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009024216-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6bd0cdbc5c67cf4957ed83c89140748e |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-46 |
| filingDate | 2007-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e1b34b435c759cfe81cdbc57ed075de6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff11526c06536fb199dbb594cca3b438 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5662e09365f27f6539f6b62cf7476386 |
| publicationDate | 2009-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2009024216-A |
| titleOfInvention | Method of electrolytic oxidation of etching waste liquid |
| abstract | An etching waste solution on an anode surface in a method of passing an etching waste solution containing iron chloride or copper chloride through an electrolytic bath as an electrolytic solution and electrolytically oxidizing low valence ions in the etching waste solution to expensive ions. The present invention provides a method for efficiently electrolytically oxidizing an etching waste liquid in terms of capital investment and operation cost while suppressing excessive oxidation of the catalyst and preventing generation of chlorine gas from the electrolytic cell. An etching waste solution containing iron chloride is passed through an electrolytic cell composed of an anode chamber and a cathode chamber separated by a diaphragm as an electrolytic solution, and low-valent ions in the etching waste solution are electrolyzed into expensive ions. In the method of oxidizing, using a specific electrolytic cell, the etching waste liquid is supplied to the electrolytic cell, and 15 to 50% of the amount of liquid discharged from the anode chamber is circulated as the supplied liquid, while draining from the anode chamber. The control value of the oxidation-reduction potential (based on silver / silver chloride electrode) is controlled to 550 to 800 mV. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017514015-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113637973-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112939055-A |
| priorityDate | 2007-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.