http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009021606-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-511
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
filingDate 2008-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9de0d8fd7c175d1b4c05108bea99ab73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_708d80f4fc343e33aef0b7f14a22fe89
publicationDate 2009-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009021606-A
titleOfInvention Planar antenna and plasma processing apparatus
abstract A planar antenna and a plasma processing apparatus for achieving high-quality plasma processing by preventing a dielectric plate from being separated are provided. A planar antenna used in a plasma processing apparatus for supplying a microwave into a processing container to generate plasma and processing the substrate with the plasma, the planar antenna having a plurality of slits 210a, In the slit, a first slit 212a and a second slit 214a slightly spaced from the first slit are arranged in a pair. [Selection] Figure 8
priorityDate 2008-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 22.