Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C9-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C9-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-06 |
filingDate |
2007-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d71db86958ca8dbf1703c45da05396c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90740e023106f9b14b04a2c90a96490b |
publicationDate |
2009-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2009018224-A |
titleOfInvention |
Film forming method and film forming apparatus |
abstract |
To provide a film forming method and a film forming apparatus capable of forming a silica-based film under normal pressure while preventing an increase in dielectric constant due to generation of ozone. The film forming method and film forming apparatus of the present invention irradiate a silica-based film forming composition with ultraviolet light through a blocking member that blocks at least part of light having a wavelength of 200 nm or less while heating. It has the means to do. By having this means, it is possible to form a silica-based film under normal pressure while preventing an increase in dielectric constant due to generation of ozone. [Selection] Figure 1 |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170070179-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016088882-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101954551-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016088882-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I689622-B |
priorityDate |
2007-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |