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filingDate 2007-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd9ef4c8d0718239f4755f1b035dfa77
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publicationDate 2009-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009008770-A
titleOfInvention Laminated structure and manufacturing method thereof
abstract A laminated structure in which an Al alloy is directly connected without increasing the contact electric resistance between an oxide transparent conductive film and an Al alloy film, wiring resistance is small, and galvanic corrosion is unlikely to occur in an electrolyte solution such as a developer. A manufacturing method thereof is provided. A method of manufacturing a laminated structure in which an oxide transparent conductive film and an Al alloy film are directly connected, the first step of forming the oxide transparent conductive film on a substrate, and the oxidation A second step of forming an Al alloy film containing an alloy component having a smaller ionization tendency than aluminum on the material transparent conductive film; and the Al alloy film is made to have a temperature higher than a precipitation temperature of an intermetallic compound composed of aluminum and the alloy component. And a third step of heating. [Selection figure] None
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