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filingDate 2007-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7fcfb8235f3e5ea4dc34cec7b3da6055
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publicationDate 2009-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009004645-A
titleOfInvention Nitride-based semiconductor laser device and manufacturing method thereof
abstract A nitride semiconductor laser device having a buried layer having high thermal conductivity and low film stress is provided. The present invention relates to a nitride-based semiconductor laser device having a ridge stripe structure, wherein the ridge stripe has a buried layer made of aluminum oxynitride AlO x N y (y = 1−2x / 3). It is characterized by. [Selection] Figure 17
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2018180524-A1
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Total number of triples: 36.