http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009004126-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317
filingDate 2007-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_030e920a918d9cb46205ddb6ef4a04c4
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publicationDate 2009-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009004126-A
titleOfInvention Charged particle beam processing equipment
abstract Provided is a charged particle beam processing apparatus capable of ensuring high flatness of a hole filling trace while shortening a time required for filling a processing hole. Gas cylinders 22A and 22B filled with different kinds of charged particle beam source gases, an ion beam column 3 including a charged particle beam optical system for focusing and irradiating a sample 13 with an ion beam 2, and a sample 13 are held. In a charged particle beam processing apparatus having a holder 4 and a gas gun 11, an ion beam 2 for extracting the microsample 81 and an ion beam 2 used for film deposition including hole filling after extracting the microsample 81 are used. Change the type of source. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102645423-A
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priorityDate 2007-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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