Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_421cadb30fc0074fe61126eb980d19d6 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317 |
filingDate |
2007-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_030e920a918d9cb46205ddb6ef4a04c4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4fe1acac194b0793eb95b8ee1a491ae0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_95e533a0eb20b614e3ee4150b0c492ec http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_efae98e548758a47c517ea3662394641 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a6f569262d74fd455a3fc082600dd26 |
publicationDate |
2009-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2009004126-A |
titleOfInvention |
Charged particle beam processing equipment |
abstract |
Provided is a charged particle beam processing apparatus capable of ensuring high flatness of a hole filling trace while shortening a time required for filling a processing hole. Gas cylinders 22A and 22B filled with different kinds of charged particle beam source gases, an ion beam column 3 including a charged particle beam optical system for focusing and irradiating a sample 13 with an ion beam 2, and a sample 13 are held. In a charged particle beam processing apparatus having a holder 4 and a gas gun 11, an ion beam 2 for extracting the microsample 81 and an ion beam 2 used for film deposition including hole filling after extracting the microsample 81 are used. Change the type of source. [Selection] Figure 1 |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102645423-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010176852-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8703247-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012522346-A |
priorityDate |
2007-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |