| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-265 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B32-162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B31-02 |
| filingDate |
2006-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2008-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2008540313-A |
| titleOfInvention |
Nanostructure generation method and apparatus |
| abstract |
The present invention relates to a method of forming a nanostructure or nanomaterial. The method comprises providing a thermal control barrier (17) on the substrate (15) and forming a nanostructure or nanomaterial. This method may be used, for example, to form carbon nanotubes by plasma enhanced chemical vapor deposition using a carbon-containing gas plasma. The temperature of the substrate (15) may be maintained below 350 ° C. during the formation of the carbon nanotubes. [Selection] Figure 2 |
| priorityDate |
2005-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |