http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008536991-A

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filingDate 2006-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2008-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2008536991-A
titleOfInvention Polyether polyols, polyester polyols and polyurethanes with low residual aldehyde content
abstract The present invention provides polyether polyols, polyester polyols and polyurethanes having a low residual aldehyde content. The present invention relates to a method for preventing the formation of aldehyde impurities in a polyether polyol, polyester polyol or polyurethane, wherein the polyether polyol, polyester polyol or polyurethane has an effective amount of (a) a phenolic antiresistant. Oxidant, (B) (i) an amine-based antioxidant, Described is a method comprising blending one or more compounds selected from (ii) benzofuran-2-one, and (iii) phosphite or phosphonite, or (iV) mixtures thereof. [Selection figure] None
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019526689-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020508371-A
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