http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008536302-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32125 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02074 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 |
| filingDate | 2006-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2008-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008536302-A |
| titleOfInvention | Dihydroxy enol compounds for use in chemical and mechanical polishing compositions containing metal ion oxidants |
| abstract | 1) water; 2) optionally abrasive material; 3) oxidizing agent, preferably peroxide type oxidizing agent; 4) small amount of soluble metal ion oxidizer / polishing accelerator, metal bound to particles such as abrasive particles And / or 5) at least one a) a small amount of a chelating agent, b) a small amount of a dihydroxy enolic compound, and c) a small amount of an organic promoter. A polishing composition comprising: Ascorbic acid in an amount of less than 800 ppm, preferably in the range of about 100 to 500 ppm, is the preferred dihydroxy enolic compound. This polishing composition and polishing method is useful for substantially all metals and metal compounds found in integrated circuits, but is particularly useful for tungsten. The invention also relates to polishing compositions comprising surface-modified colloidal abrasives and related methods using these compositions, in particular to chemical mechanical planarization, wherein The slurry contains a low concentration of chelating free radical inhibitor, non-chelating free radical inhibitor, or both. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016537438-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9022834-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012079717-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013179720-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8592317-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10011741-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014086732-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9062230-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9305476-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020074353-A |
| priorityDate | 2005-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 347.