| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-001
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G75-08 |
| filingDate |
2004-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2008-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2008502938-A |
| titleOfInvention |
Photosensitive resin composition having high refractive index |
| abstract |
The present invention includes (A) a compound having a molecule having at least one or more thiirane rings, and a total number of thiirane rings and / or epoxy rings in the molecule being 2 or more, and (B) photoacid generation A photosensitive resin composition comprising an agent, the composition having a refractive index of at least 1.6 and comprising subjecting the photosensitive resin composition of the present invention to photolithography A method for obtaining a structure is disclosed. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018092600-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010248500-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012185431-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017088775-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113735819-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2018092600-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11698479-B2 |
| priorityDate |
2004-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |