http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008308748-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9ec030fc062b270c25327af9127bed3a
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-16
filingDate 2007-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dca24ee8adfd38f86212d415d6d387a5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_017b30ecce9c523ab0b172143aa51914
publicationDate 2008-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2008308748-A
titleOfInvention Method for forming copper film
abstract The present invention provides a copper film forming method capable of forming a thin and uniform copper film on a substrate surface using copper formate which is stable and has good handleability. A substrate that is heated to a predetermined temperature is placed in an inert gas atmosphere that is inert at the heating temperature, and copper formate in a solvent that evaporates at the heating temperature toward the surface of the substrate. The copper formate solution in which the solution is dissolved is sprayed, the solvent in the copper formate solution sprayed at the heating temperature is evaporated, and the copper formate is thermally decomposed without using a catalyst to form a thin film on the predetermined surface of the substrate. A copper film is formed. [Selection figure] None
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016050347-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013508934-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016141852-A
priorityDate 2007-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 32.