| abstract |
An object of the present invention is to provide a material for a chemically amplified photoresist for F 2 laser, which has excellent transparency and improved dry etching resistance. Equation (13): -(M1)-(M2)-(N)-(13) (In the formula, M1 is a structural unit derived from a norbornene derivative having a fluorine-containing alcohol structure; M2 is an ethylenic monomer having 2 or 3 carbon atoms and containing at least one fluorine atom) A polymer having a ring structure in a polymer main chain represented by a structural unit obtained from a polymer; N is a structural unit derived from a monomer copolymerizable with structural units M1 and M2, A fluorine-containing polymer having a number average molecular weight of 500 to 1,000,000 including 1 to 99 mol%, 1 to 99 mol% of the structural unit M2, and 0 to 98 mol% of the structural unit N. [Selection figure] None |