http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008302330-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f09378c018e7719f171f7e91f2dd60fd |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24 |
| filingDate | 2007-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e266f4cb3b8de826114f79c58113b74 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58b34b59c7eee3bafd4100c1d609db00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7f2e904e92ad5a3dbbc884fff22d1a1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3eab247bd4d0c9724ba682e373ce6c9a |
| publicationDate | 2008-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008302330-A |
| titleOfInvention | Method for forming inorganic material pattern using aerosol |
| abstract | The present invention provides a method capable of forming a fine inorganic material pattern easily, with high productivity, and at low cost even in an inorganic material, in particular, a difficult-to-etch material. A step (I) of forming an aerosol by mixing a carrier gas with fine particles of an inorganic material, and ejecting the aerosol from a nozzle and colliding with the substrate through a coating having a predetermined pattern, the inorganic material on the substrate A method for forming an inorganic material pattern comprising the step (II) of forming an inorganic material pattern comprising fine particles, wherein the coating film having the predetermined pattern forms a resist film comprising a resist composition on a substrate surface, A method for forming an inorganic material pattern, which is a resist film having a predetermined pattern formed by irradiating an active energy ray directly or through a mask to a resist film and further developing the resist film. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101961966-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140016334-A |
| priorityDate | 2007-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 173.