http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008293595-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-855 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-65 |
| filingDate | 2007-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_98f73e54545ff2527d41217bc4685884 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e35f9fc96a47f31d9d6482bbb2f6752 |
| publicationDate | 2008-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008293595-A |
| titleOfInvention | Magnetic recording medium and method for manufacturing the same |
| abstract | [PROBLEMS] To provide a magnetic recording medium that can achieve both material processability and reduction of mask damage even when an organic resist mask is used, has little change in pattern size, and has stable magnetic characteristics, and efficiently manufactures the magnetic recording medium. Of a method for manufacturing a magnetic recording medium that can be used. An uneven pattern forming step of forming an uneven pattern on the resist layer in a magnetic recording medium having a resist layer and a magnetic layer in this order on the surface of the substrate for the magnetic recording medium, and using the uneven pattern of the resist layer as a mask, And a dry etching step of forming an uneven shape on the magnetic layer by dry etching using argon ions generated by introducing argon gas into a high-density plasma source. [Selection] Figure 1 |
| priorityDate | 2007-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 16.