| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1818
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1812 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-22 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2007-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af1c170f6867f63d090cb08fbd8c503f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0806ad1e19c2fad0b33a56cea7d2b8b0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a20104ecee0ec4bcd8f7e4cf2aa6743 |
| publicationDate |
2008-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2008287057-A |
| titleOfInvention |
Chemically amplified positive resist composition |
| abstract |
Provided is a chemically amplified positive resist composition that has excellent resolution, is less likely to have a waveform shape defect in a resist pattern, and can reduce pattern variations due to SW. A chemically amplified positive resist composition containing a resin that becomes soluble in an aqueous alkali solution after an acid-labile group is cleaved by the action of an acid, wherein the resin is a polymer of hydroxystyrene. It contains a unit (I) and a polymer unit (II) of (meth) acrylate having an alicyclic group, and further has a polymer unit of hydroxystyrene (III) having a benzoyloxy group and a naphthalene structure in the side chain A composition containing one or more polymerized units of (meth) acrylate (IV). [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9051405-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10766992-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009086358-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101960570-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010235925-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014197200-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160150046-A |
| priorityDate |
2007-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |