http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008282886-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
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filingDate 2007-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0a1c6c3294ffbdd1a827eea0ca5cadd
publicationDate 2008-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2008282886-A
titleOfInvention Deposition method
abstract A low-power plasma can be easily generated, maintained, and controlled, and a plasma polymerized polymer film having a low dielectric constant can be easily formed. A raw material gas is introduced into a vacuum chamber 1 and a plasma by glow discharge is excited between a substrate 2 in the vacuum chamber 1 and a counter electrode 4 opposite to the substrate 2 to form a thin film on the surface of the substrate 2. The substrate 2 is irradiated with light having energy equal to or higher than the work function of the surface of the substrate 2, and a DC pulse voltage is applied between the substrate 2 and the counter electrode 4 to oppose the substrate 2. Glow discharge is started between the electrodes 4. [Selection] Figure 1
priorityDate 2007-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 20.