http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008270833-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_be055db3c1a09879df07379ba969e223 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32412 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-26513 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265 |
| filingDate | 2008-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f97251da87aa6c61e25d4366ad69b00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4008c4ab0eb0ba4f2df201c9526871a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_628d6a1d9f5c57ef6cc7114dc472063c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f1d890b9d2ab3727d4f42ef7731e82c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6996d2533b1342f3c297e36728a0309e |
| publicationDate | 2008-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008270833-A |
| titleOfInvention | Plasma doping method and apparatus |
| abstract | A plasma doping method and apparatus excellent in reproducibility of impurity concentration introduced into a sample surface. In a vacuum vessel 1, gas is ejected from a gas ejection hole 5 provided in a counter electrode 3 toward a substrate 7 placed on a sample electrode 6, and exhausted by a turbo molecular pump 8 serving as an exhaust device. The pressure control valve 9 keeps the inside of the vacuum vessel 1 at a predetermined pressure, and the distance between the counter electrode 3 and the sample electrode 6 is set to be equal to the area of the counter electrode 3 without plasma diffusion outward. Plasma doping is performed by making the capacity sufficiently small, generating capacitively coupled plasma between the counter electrode 3 and the sample electrode 6. A low concentration gas containing impurities such as diborane and phosphine is used as the gas. [Selection] Figure 1A |
| priorityDate | 2006-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 33.