http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008266701-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7f278bf3e3bd12896f71fc0e87dd1684 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C26-00 |
filingDate | 2007-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f48da773265fe634e6c6836587df8e17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e2c921de5a684aad558550ea3840d8f |
publicationDate | 2008-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2008266701-A |
titleOfInvention | Method for manufacturing vacuum cooling member, vacuum cooling member, and vacuum equipment |
abstract | A vacuum cooling member manufacturing method, a vacuum cooling member, and a vacuum device are provided that have a high heat radiation property on the surface and that emit less gas from the surface. An oxide film 13 is formed on a main surface 12a of a substrate 12 by performing an anodic oxidation process involving spark discharge, that is, a micro-arc oxidation process, on the substrate 12. By using the micro-arc oxidation treatment, for example, when an aluminum alloy containing Si is used as the base material 12, even if Si is crystallized, crystal defects of the oxide film 13 are increased by this Si. It is possible to form a dense oxide film 13 having a thickness of 5 μm or more and 20 μm or less that can be suppressed. [Selection] Figure 3 |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010116747-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104694930-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010189704-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5432985-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013119634-A |
priorityDate | 2007-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.