Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L63-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-00 |
filingDate |
2007-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ebea70ec018b8a9505a1d44f45a6eeef http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11ca2a4ededdbb97ddb0e4438af31f09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fef0b45e13a887c1fb5b124e3b22e400 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd73090e463977afc52bb2fac69899bc |
publicationDate |
2008-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2008257892-A |
titleOfInvention |
Graft polymer pattern forming method, conductive pattern forming method, and organic EL display device |
abstract |
A graft polymer pattern forming method capable of easily forming a graft polymer pattern excellent in adhesion to a substrate only in a desired region of the substrate surface, and forming a fine conductive pattern without performing an etching process And a conductive pattern forming method capable of forming a conductive pattern having excellent adhesion to the base material even when the surface of the base material has few irregularities. (A) a step of directly applying a composition containing a photo radical generator on a substrate in a pattern, (b) a step of immobilizing the photo radical generator on the substrate, and (c) After bringing the compound having a polymerizable double bond into contact with the surface of the substrate having the immobilized photoradical generator, energy is applied to the surface of the substrate to immobilize the photoradical generator. Forming a graft polymer pattern in a region where the polymer exists. [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010126699-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016158669-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011094192-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013227489-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016072411-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015532779-A |
priorityDate |
2007-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |