| abstract |
Disclosed is a polishing pad capable of preventing a reduction in polishing characteristics and planarization characteristics over the operating life of the polishing pad. The polishing pad comprises (a) particulate thermoplastic polymer (eg, particulate thermoplastic polyurethane), crosslinked particulate polymer (eg, crosslinked particulate polyurethane and / or Or a particulate polymer that can be selected from crosslinked particulate polyepoxides and mixtures thereof; and (b) an organic polymer binder (eg, polyurethane binder and / or polyepoxide that can be bound together with particulate polymer). Binder). The particulate polymer and organic polymer binder are distributed substantially throughout the working surface of the polishing pad, and the pad is 2% to 50% pore volume percent based on the total volume of the polishing pad. Have [Selection figure] None |