http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008241871-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F32-08 |
| filingDate | 2007-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25eac08c5fa328b123f8ee55d0d67a3f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f110e0e7102931afe7edfc0254e94e54 |
| publicationDate | 2008-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008241871-A |
| titleOfInvention | Resist composition and pattern forming method using the same |
| abstract | The object of the present invention is to solve the problem of performance improvement technology in microfabrication of semiconductor elements using actinic rays or radiation, in particular, KrF excimer laser light, electron beam or EUV light. An object of the present invention is to provide a positive resist composition which has reduced roughness and density dependence and has high sensitivity and good dissolution contrast, particularly in EUV exposure, and a pattern forming method using the same. The resin includes a specific repeating unit having an indenone structure, a resin having a repeating unit that decomposes by the action of an acid and increases alkali solubility, and a compound that generates an acid upon irradiation with actinic rays or radiation. And a pattern forming method using the resist composition. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013047117-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102335033-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210026569-A |
| priorityDate | 2007-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 177.