http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008232905-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N37-00 |
filingDate | 2007-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfae59e959d199a8d35045973e8bd022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_633fe81736d25e49f2c5b61625cc22c0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5ef79ef5316809a8b9310abc92d4ca5 |
publicationDate | 2008-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2008232905-A |
titleOfInvention | Manufacturing method of substrate for producing microarray |
abstract | Provided is a method for producing a substrate for producing a microarray, which can easily perform position-selective formation of a monomolecular film for immobilizing a target molecule in the production of a substrate for producing a microarray. A method for producing a substrate for producing a microarray, wherein at least a monomer unit having a hydroxyl group has a content of 5 mol% or less based on the whole monomer unit as a binder. Using the amplification resist composition, a step of forming a resist film on the substrate, a step of patterning the resist film, and then forming a monomolecular film having a silicon oxide chain on the substrate having the patterned resist film And a step of removing the resist film thereafter. A method of manufacturing a microarray manufacturing substrate, comprising: [Selection] Figure 1 |
priorityDate | 2007-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 132.