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filingDate 2007-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7736d12a01cf1dc727a0ac9d7dfbdb10
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publicationDate 2008-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2008223073-A
titleOfInvention Porous nanostructure and manufacturing method thereof
abstract Disclosed is a porous nanostructure made of anodized alumina and having a bottom barrier layer having a thickness larger than that of a conventional one, and a method for producing the same. A porous nanostructure including at least an anodized alumina film. The anodized alumina film includes a nanohole layer and a bottom barrier layer, and the thickness of the bottom barrier layer is 200 nm or more. Since the thickness of the bottom barrier layer is larger than that of the conventional one and the insulating property can be improved, it is possible to improve the light emission intensity and reliability when used in an electroluminescent element. [Selection] Figure 1
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