http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008209911-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_67f2bb9a79bd8433343ae221f81551cf |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-49863 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-49827 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-49809 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C2200-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C2001-7628 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-49872 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-498 |
| filingDate | 2008-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_977b0d28b7aca1313df5a69fa518384e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84fbaede16a62c10cb5befe08b8326a4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0535a3547e603ded75e4fbc43af5df99 |
| publicationDate | 2008-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008209911-A |
| titleOfInvention | Photothermographic material |
| abstract | The present invention provides a photothermographic material in which generation of scratches during thermal development and contamination in a thermal development apparatus are prevented. A photosensitive layer containing a photosensitive silver halide, a non-photosensitive aliphatic carboxylic acid silver salt, a reducing agent and a binder resin on at least one surface of a support, and a non-photosensitive layer, In a photothermographic material having a non-photosensitive layer on the opposite side of the photosensitive layer on the support, a silicon-containing polymer lubricant is applied to the non-photosensitive layer on the photosensitive layer side or the non-photosensitive layer on the opposite side of the photosensitive layer And a photothermographic material comprising a fluorine compound represented by the following general formula (SF): General formula (SF) (Rf− (L 1 ) m1 −) p − (L 2 ) n1 − (A) q [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012504170-A |
| priorityDate | 2007-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 400.