| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F228-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
2007-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ecf83b19784592c269a20a17301f059
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59224293f0057bb4dbfd15a239762891
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5783a7a19d175409e79c32dee7015004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ee2a12508ae7c8f31813d949c4b324b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30a39e540e419bb09c6cc76ad65e7dc9 |
| publicationDate |
2008-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2008209799-A |
| titleOfInvention |
Photoresist pattern forming method |
| abstract |
To provide a photoresist pattern forming method using a radiation-sensitive resin composition and an upper layer film-forming composition having sufficient transparency at an exposure wavelength, particularly 248 nm (KrF) and 193 nm (ArF). A photoresist comprising a resin containing more than 60 mol% of a monomer that becomes alkali-soluble by the action of an acid and a radiation-sensitive acid generator applied on a substrate. An upper layer film-forming composition containing an alkali-soluble resin containing a monomer is formed on the photoresist film to form an upper layer film, and an immersion medium is formed between the upper layer film and the lens. A resist pattern can be obtained by irradiating the photoresist film and the upper layer film with exposure light through the immersion medium and a mask having a predetermined pattern, followed by development. [Selection] Figure 3 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013061648-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7352810-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010134368-A |
| priorityDate |
2007-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |