http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008208404-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_31077ac07729350a422dcf2ca1529323 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B9-00 |
| filingDate | 2007-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3fd3be7836a891ab41d1a6d7b5d11e18 |
| publicationDate | 2008-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008208404-A |
| titleOfInvention | Thin film and method for manufacturing the same |
| abstract | A method for efficiently producing a gas barrier thin film having excellent transparency and gas barrier properties in a method such as catalytic CVD, and a thin film having a stable film thickness obtained by the method. In a thin film manufacturing method in which a plurality of types of source gases are reacted under reduced pressure, and a thin film made of the reaction product is formed on a substrate disposed in a reduced pressure system, a first source gas inlet 4 is used. After the nitrogen-containing gas and hydrogen are mixed by the source gas mixing means, the nitrogen-containing gas and hydrogen are held in the system and supplied in the vicinity of the heated metal body 3, and the second source gas is introduced into the decompression system. A thin film manufacturing method in which a silane-based gas is introduced from the mouth 5 and a thin film obtained from the manufacturing method are proposed. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9410245-B2 |
| priorityDate | 2007-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.