| abstract |
A siloxane polymer synthesized by a new method capable of forming a porous film having a mechanical strength superior to that of a conventional siloxane polymer using a siloxane polymer which is an industrially preferred material, Provided are a film-forming composition containing the same, a method for forming a porous film, a formed porous film, and a semiconductor device having high performance and high reliability incorporating the porous film. In a method for producing a siloxane polymer by hydrolytic condensation of a hydrolyzable silane compound, a general formula (1) (SiO 1.5 -O) n n- X + n (1) (However, X represents NR 4 , R represents a linear or branched alkyl group having 1 to 4 carbon atoms, and each may be independently the same or different. Represents an integer.) A silsesquioxane cage compound salt represented by the following formula is prepared, and a siloxane polymer obtained by hydrolyzing and condensing a hydrolyzable silane with the silsesquioxane cage compound salt is used. [Selection figure] None |