http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008193076-A

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filingDate 2008-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2008-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2008193076-A
titleOfInvention Lithographic method
abstract A method capable of achieving a pattern with an increased resolution without using a wavelength shorter than 193 nanometers is provided. A method of providing a pattern on a substrate, wherein a layer of photoresist 6 is provided on the substrate, a layer of top coating is provided on the photoresist layer, the photoresist layer is exposed by lithography, and the photoresist is applied. Develop to form the structure, cover the structure with a coating layer, induce a chemical reaction between the photoresist and the coating layer that does not occur in the top coating, thereby forming a region of the modified coating layer 18, Removing the layer, thereby leaving a patterned structure formed from the region of the modified coating layer. [Selection] Fig. 2 (f)-(k)
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020092274-A
priorityDate 2007-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 26.