http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008193076-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5e5e4671b3ba1fd59502c47747a80896 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2008-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd2724fd6ff99e281e3bc8d9368b47ae http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b596fbcb67fe65cfe111622a34d1deb1 |
publicationDate | 2008-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2008193076-A |
titleOfInvention | Lithographic method |
abstract | A method capable of achieving a pattern with an increased resolution without using a wavelength shorter than 193 nanometers is provided. A method of providing a pattern on a substrate, wherein a layer of photoresist 6 is provided on the substrate, a layer of top coating is provided on the photoresist layer, the photoresist layer is exposed by lithography, and the photoresist is applied. Develop to form the structure, cover the structure with a coating layer, induce a chemical reaction between the photoresist and the coating layer that does not occur in the top coating, thereby forming a region of the modified coating layer 18, Removing the layer, thereby leaving a patterned structure formed from the region of the modified coating layer. [Selection] Fig. 2 (f)-(k) |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020092274-A |
priorityDate | 2007-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.