http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008181968-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-86 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-77 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2259-804 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2258-0216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2251-104 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F24F7-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate | 2007-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ecd979fe1a5147d2b36d7a54ecfa7a48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_602a5fc5738819ab532d3659431364f8 |
| publicationDate | 2008-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008181968-A |
| titleOfInvention | Semiconductor manufacturing system and semiconductor device manufacturing method |
| abstract | A semiconductor manufacturing system capable of more efficiently removing an organic solvent containing siloxane is provided. A semiconductor manufacturing system is arranged in a clean room, a filter 5 for removing an organic solvent containing siloxane from a gas supplied from outside the clean room 100, and a filter 5 arranged in the clean room 100 and passed through the filter 5. A first semiconductor manufacturing apparatus 6 that uses light in an atmosphere containing a gas; a second semiconductor manufacturing apparatus 7 that is disposed in the clean room 100 and has an exhaust port that discharges a gas containing an organic solvent containing siloxane; The organic solvent containing siloxane is disposed in the exhaust port 7a of the second semiconductor manufacturing apparatus 7 and filtered from the exhaust gas output from the exhaust port 7a, and is filtered into the exhaust duct 1 for exhausting the exhaust gas out of the clean room 100. And a removing device 8 for discharging gas. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015056559-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160071430-A |
| priorityDate | 2007-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.