http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008172193-A

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-91
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8242
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308
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filingDate 2007-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60ea28a01d4e427f5610acd2c434d8f1
publicationDate 2008-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2008172193-A
titleOfInvention Etching solution composition for preventing capacitor leaning and capacitor manufacturing method using the same
abstract The present invention provides a composition used for wet etching that can effectively prevent a leaning phenomenon between lower electrodes that occurs during the manufacture of a cylinder-type capacitor, and a capacitor manufacturing method using the same. In the present invention, hydrofluoric acid (HF), ammonium fluoride (NH 4 F), alkylammonium fluoride (RNH 3 F; R is a linear or side chain alkyl of C 1 to C 10 ), Since the leaning phenomenon of the capacitor can be effectively suppressed at the time of forming the capacitor by using an etching liquid composition containing a surfactant, an alcohol compound and water, the height of the storage electrode of the capacitor can be secured. Capacitors with improved capacitance can be manufactured, and the process will be stabilized not only in devices currently under development but also in future device development. [Selection] Figure 3d
priorityDate 2007-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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