| abstract |
The present invention provides a curable resin composition that provides a cured film having a low refractive index and excellent scratch resistance even with a low irradiation light amount, and an antireflection film having a low refractive index layer composed of the cured film. SOLUTION: (A) an ethylenically unsaturated group-containing fluoropolymer, (B) (meth) acrylate compound, (C) silica particles having a number average particle diameter of 1 to 100 nm, and (D) the following formula (d- A curable resin composition containing a photopolymerization initiator having a structure represented by 1). [In formula (d-1), R 1 , R 2 , R 4 and R 5 are each independently an alkyl group having 1 to 4 carbon atoms, R 3 is an alkylidene group having 1 to 4 carbon atoms or 2 to 2 carbon atoms. Represents an alkylene group. ] [Selection] Figure 1 |