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publicationDate 2008-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2008155342-A
titleOfInvention Manufacturing method of fine structure
abstract A movable structure including an insulating layer made of an inorganic material such as silicon oxide can be easily manufactured with a high yield by using a sacrificial layer made of a resin. A metal sacrificial layer 107 is formed on the upper surfaces of a support member 105 and a first resin sacrificial layer 106. Next, a silicon oxide film is deposited on the upper surface of the metal sacrificial layer 107 by a sputtering method. The insulating layer 108 is formed by processing using the photolithography technique and the etching technique, and then a movable structure including the plate-like upper electrode 111, the beam part 112, and the anchor part 113 is formed. State. [Selection] Figure 2
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