| abstract |
An antireflection film having excellent antistatic properties for preventing dust adhesion, excellent productivity, high adhesion, and high physical strength such as scratch resistance is provided. A composition comprising a transparent conductive material comprising a polymer on a transparent support and a crosslinking point forming compound having a plurality of crosslinking reactive groups, wherein at least one crosslinking reactive group is crosslinked with the transparent conductive material. An antireflection film comprising at least one conductive layer formed from a material and at least one low refractive index layer. [Selection figure] None |