http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008129519-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ee1c19da359446fb5c4f0458a57b783d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F236-02 |
| filingDate | 2006-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f547659a3ddd38a252630d9df024dae http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6602369c5727b11b03570b310bf13f1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_311ddcbdfb459b3b688c1802943f25c9 |
| publicationDate | 2008-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008129519-A |
| titleOfInvention | Polymer for resist protective film and method for forming resist pattern |
| abstract | A resist protective film polymer and a resist pattern forming method are provided. An immersion liquid is used in an immersion lithography method in which a non-aqueous liquid medium is used, and is removed by at least one hydrofluoro solvent (S) selected from a hydrofluorocarbon solvent and a hydrofluoroether solvent. A polymer for resist protective film, comprising a repeating unit (F U ) formed by polymerization of a specific monomer (f) having a fluorine content of 40 to 75% by mass (F) And a resist pattern forming method using the resist protective film polymer. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016190221-A1 |
| priorityDate | 2006-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 171.