http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008117823-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73ebc284a55d5daf0e209d6186c9e65c
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-762
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786
filingDate 2006-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1686d6be35f000e5b8c788368b17010e
publicationDate 2008-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2008117823-A
titleOfInvention Semiconductor device manufacturing method and electronic device manufacturing method
abstract An object of the present invention is to provide a semiconductor device manufacturing method capable of improving the characteristics of an SOI structure or a semiconductor device having an SOI structure. A SiGe film and a Si film are formed on a silicon substrate, and these films are selectively removed first to form a separation groove reaching the substrate, and a silicon oxide film is formed thereon. Then, at least the side walls of the SiGe film are exposed by removing these films second, and the silicon substrate 1 is formed when the SiGe film is etched from the exposed parts to form a cavity under the Si film. Is immersed in a solution containing hydrofluoric acid, and the SiGe film is etched with a positive potential applied to the SiGe film. Thus, since the Si (or Ge) oxidation step is performed by anodic oxidation, the SiGe film can be removed with a nitric acid-free etchant. [Selection] Figure 5
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012227276-A
priorityDate 2006-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6326954
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14796
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457280313
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419520344
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24556
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24529
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559357
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14917
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419593449
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID25352
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID71360952
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523132
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID448395660
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559481
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419527398
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID944
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123

Total number of triples: 34.