http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008116926-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2007-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3236c4a2ef2062cd31a2234452a6019 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_95d22b3c2522f592605f0fc1570fc06b |
| publicationDate | 2008-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008116926-A |
| titleOfInvention | Low-sensitivity photosensitive resist underlayer film forming composition |
| abstract | PROBLEM TO BE SOLVED: To provide a photosensitive resist underlayer film forming composition used for a lower layer of a photoresist in a lithography process of a semiconductor device. A photosensitive resist underlayer film forming composition is applied onto a semiconductor substrate and baked to form a photosensitive resist underlayer film, a photoresist layer is formed on the photosensitive resist underlayer film, and the resist A step of performing a first exposure on a semiconductor substrate covered with a lower layer film and a photoresist layer using a first mask pattern, and then a first exposure using a second mask pattern having a shape different from the first mask pattern. The said photosensitive resist underlayer film forming composition used for the manufacturing method of a semiconductor device including the process of performing 2nd exposure with a lower exposure amount, and the process of developing after exposure. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9086627-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010122297-A |
| priorityDate | 2006-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 269.