| abstract |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a photospacer having good alkali developability and having a cured product having excellent flexibility and elastic recovery characteristics. SOLUTION: A hydrophilic polymer (A), a polyfunctional (meth) acrylate monomer (B), a polysiloxane (C) having two or more hydrolyzable alkoxy groups, and a radical photopolymerization initiator (D) are contained. The photosensitive resin composition (Q) for photospacers capable of alkali development, wherein the polysiloxane (C) is a condensate containing the silane compound (c1) represented by the general formula (1) as an essential constituent monomer. It is. [Formula 4] R 1 is one or more organic groups selected from the group consisting of (meth) acryloyloxyalkyl groups, glycidoxyalkyl groups, mercaptoalkyl groups, and aminoalkyl groups, wherein the alkyl group has 1 to 6 carbon atoms. , R 2 is an aliphatic saturated hydrocarbon group having 1 to 12 carbon atoms or an aromatic hydrocarbon group having 6 to 12 carbon atoms, R 3 is an alkyl group having 1 to 4 carbon atoms, and m is 0 or 1. [Selection] Figure 1 |