http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008107815-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2007-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d6af8dd7c0cc87e9165369a4681065f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6acf5e1e430edb1a472bee86f7be035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ab9fd0e67049447b5c4db1f50f5e898 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79a4c297fe26465f427b7bf18a643a56 |
| publicationDate | 2008-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008107815-A |
| titleOfInvention | Positive photosensitive composition and pattern forming method using the same |
| abstract | A positive photosensitive composition used in semiconductor manufacturing processes such as IC, circuit boards such as liquid crystal and thermal head, and other photofabrication processes, and a pattern forming method using the same. Provided are a positive photosensitive composition having improved pattern collapse and exposure latitude performance even in the formation of a fine pattern of 100 nm or less, and a pattern forming method using the same. A positive photosensitive composition comprising (A) a compound that generates an acid upon irradiation with actinic rays or radiation, and (B) a resin that increases the dissolution rate in an alkali developer by the action of the acid, (B) A positive photosensitive composition having a repeating unit having an acid-decomposable group represented by a specific structure, and a pattern forming method using the same. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014191061-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009288504-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012013961-A |
| priorityDate | 2006-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 140.