http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008096817-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2006-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9934d76f5c383f53db84f9b59d623b78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0af87f7f14f76735a6cd8f4c4a79a267 |
| publicationDate | 2008-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008096817-A |
| titleOfInvention | Positive resist composition for immersion exposure and method for forming resist pattern |
| abstract | Provided are a positive resist composition for immersion exposure and a method for forming a resist pattern, which have good lithography characteristics and have hydrophobicity suitable for immersion exposure. A resin component (A) whose alkali solubility is increased by the action of an acid and an acid generator component (B) which generates an acid upon exposure, wherein the resin component (A) is represented by the following general formula: (A′-1) [In the formula (a′-1), R 23 is an aliphatic cyclic group having the structure (I) represented by the following general formula (I-1). ] The positive resist composition for immersion exposure characterized by including the copolymer (A1) containing the structural unit (a ') represented by this. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015147688-A1 |
| priorityDate | 2006-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 235.